US 12,347,658 B2
Stage and plasma processing apparatus
Ryota Sakane, Miyagi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Jul. 28, 2021, as Appl. No. 17/386,663.
Claims priority of application No. 2020-130989 (JP), filed on Jul. 31, 2020.
Prior Publication US 2022/0037131 A1, Feb. 3, 2022
Int. Cl. H01J 37/32 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01)
CPC H01J 37/32724 (2013.01) [H01J 37/32715 (2013.01); H01L 21/6833 (2013.01); H01L 21/68735 (2013.01); H01J 2237/002 (2013.01); H01J 2237/2007 (2013.01)] 5 Claims
OG exemplary drawing
 
1. A stage for mounting a substrate thereon, the stage comprising:
an electrostatic chuck configured to attract the substrate;
a base having a first region on which the electrostatic chuck is supported and a second region on which an edge ring arranged around the substrate is supported, the first region and the second region being divided by a groove extending in an annular shape;
a shield provided in the groove and configured to thermally separate the first region and the second region, and
an annular pedestal disposed in the second region and supporting the edge ring thereon,
wherein the shield is an elastic member formed in an annular shape and is configured to protect side surfaces of the electrostatic chuck and the base facing the groove,
wherein the elastic member includes a first contact contacting the electrostatic chuck without contacting the base, and includes a second contact contacting the base without contacting the electrostatic chuck, the first contact and the second contact being separated from each other in a vertical direction,
wherein the first contact includes a first protrusion protruding inward in an annular shape which contacts the electrostatic chuck,
wherein the second contact includes a second protrusion protruding inward in an annular shape which contacts the base, and wherein the groove is formed between the electrostatic chuck and the edge ring and between the base and the annular pedestal,
wherein the elastic member does not contact an interface between the electrostatic chuck and the base.