US 12,346,032 B2
System, lithographic apparatus and method
Rob Johan Theodoor Rutten, Heeze (NL); Ruud Hendrikus Martinus Johannes Bloks, Helmond (NL); Alexandrios Mathew, San Diego, CA (US); and Ron Vennix, Bladel (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/914,903
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Apr. 1, 2021, PCT No. PCT/EP2021/058680
§ 371(c)(1), (2) Date Sep. 27, 2022,
PCT Pub. No. WO2021/213791, PCT Pub. Date Oct. 28, 2021.
Claims priority of provisional application 63/013,170, filed on Apr. 21, 2020.
Claims priority of application No. 2025372 (NL), filed on Apr. 20, 2020.
Prior Publication US 2023/0333487 A1, Oct. 19, 2023
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/706835 (2023.05) [G03F 7/706843 (2023.05); G03F 7/7085 (2013.01); G03F 7/70858 (2013.01); G03F 7/70933 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system comprising:
a measurement device configured to measure a beam and to determine a signal based on the measured beam; and
a fluid supply device configured to provide fluid as a fluid stream to, or surrounding, the beam,
wherein the system is configured to calculate noise of the signal, and to adjust, based on the calculated noise, a parameter of the fluid of the fluid stream.