| CPC G03F 7/7055 (2013.01) [G01B 11/002 (2013.01); G02B 26/0816 (2013.01); G02B 27/126 (2013.01); G03F 7/70025 (2013.01); G03F 7/7015 (2013.01); G03F 7/70208 (2013.01); G03F 7/70408 (2013.01)] | 9 Claims |

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1. A device for regulating and controlling an incident angle of a light beam in a laser interference lithography process, which is applied to a laser interference lithography system, the laser interference lithography system comprises a substrate, a first lens and a second lens facing each other, and a first universal reflecting mirror located at a focus of the first lens,
wherein, the device for regulating and controlling an incident angle of a light beam comprises a beam splitter prism, a first decoupling lens, a first position detector and a feedback control system,
wherein, the beam splitter prism is provided between the first lens and the second lens, the first decoupling lens is provided between the first position detector and the beam splitter prism, and the feedback control system is connected to the first position detector and the first universal reflecting mirror,
wherein, the beam splitter prism is used for reflecting a first incident light passing through the first universal reflecting mirror, the first decoupling lens is used for enabling a first reflected light from the beam splitter prism to enter into the first position detector, the first position detector is used for measuring a position of the light beam and transmitting a measurement result to the feedback control system, and the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incidence angle of an exposure light beam,
wherein, when a deflection angle of an interference fringe of the substrate is θe, the measurement result of the position of the light beam measured by the first position detector is:
![]() wherein, ΔLx represents an offset amount of the light beam in a x direction, ΔLy represents an offset amount of the light beam in a y direction, f2 represents a focal distance of the second lens, Pt represents an intercept of an interference fringe at a time t, and λ represents a laser wavelength.
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