US 12,345,903 B2
Photo resist as opaque aperture mask on multispectral filter arrays
Kevin R. Downing, Westford, MA (US)
Assigned to Materion Corporation, Mayfield Heights, OH (US)
Filed by MATERION CORPORATION, Mayfield Heights, OH (US)
Filed on Aug. 7, 2023, as Appl. No. 18/366,081.
Application 17/584,837 is a division of application No. 16/129,309, filed on Sep. 12, 2018, granted, now 11,269,120, issued on Mar. 8, 2022.
Application 18/366,081 is a continuation of application No. 17/584,837, filed on Jan. 26, 2022, granted, now 11,762,137.
Claims priority of provisional application 62/557,909, filed on Sep. 13, 2017.
Prior Publication US 2023/0375761 A1, Nov. 23, 2023
Int. Cl. G02B 5/20 (2006.01); G03F 7/00 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01)
CPC G02B 5/201 (2013.01) [G03F 7/0015 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/70308 (2013.01)] 18 Claims
OG exemplary drawing
 
1. An optical apparatus, comprising:
a substrate having a light entrance surface and a light exit surface, wherein the substrate comprises an optical wafer; and
an aperture mask printed on the light entrance surface of the substrate so as to provide an opening over a portion of the substrate for light to travel therethrough and between the light entrance surface and the light exit surface of the substrate,
wherein the aperture mask includes a photoresist and does not include a dark mirror coating, and
wherein a dark mirror coating is not present between the substrate and the aperture mask.