CPC G03F 1/24 (2013.01) [G03F 1/46 (2013.01)] | 19 Claims |
1. A reflective mask blank comprising: a substrate; a multilayer reflective film on the substrate; and an absorber film on the multilayer reflective film, wherein
the absorber film comprises an absorption layer and a reflectance adjustment layer,
the absorption layer comprises tantalum (Ta), boron (B), nitrogen (N), and at least one additive element selected from hydrogen (H) and deuterium (D),
a content of the boron (B) in the absorption layer is more than 5 atomic %, and
a total content of the at least one additive element in the absorption layer is 0.1 atomic % or more and 30 atomic % or less.
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