| CPC C23C 16/4558 (2013.01) [B01J 4/005 (2013.01); B01J 4/008 (2013.01); C23C 16/4412 (2013.01); C23C 16/45587 (2013.01)] | 20 Claims |
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1. A process chamber for substrate processing comprising:
an inject ring comprising one or more injector passages disposed through and on one half of the inject ring; and
one or more gas injectors, each of the one or more gas injectors disposed inside of one of the injector passages, each of the gas injectors comprising:
an injector insert;
a gas introduction passage;
a gas diffusion passage fluidly coupled to the gas introduction passage, the gas diffusion passage comprising:
a plurality of passage splits; and
a plurality of pathways;
a first plenum disposed at a distal end of the gas diffusion passage, the first plenum defining a single volume;
an outlet opening disposed through an inject surface of the injector insert opposite the gas introduction passage and in fluid communication with the gas diffusion passage; and
a fin array disposed between the first plenum and the outlet opening, the fin array, comprising:
a plurality of fins disposed between a bottom surface and a top surface of the injector insert, the plurality of fins distributed to form a plurality of pathway extensions.
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