US 12,662,386 B2
Hollow silica particles and method for producing the same
Hiromichi Kamo, Tokyo (JP); Masashi Kondo, Tokyo (JP); and Hajime Katayama, Tokyo (JP)
Assigned to AGC Inc., Tokyo (JP); and AGC SI-TECH CO., LTD., Kitakyushu (JP)
Filed by AGC Inc., Tokyo (JP); and AGC SI-TECH CO., LTD., Kitakyushu (JP)
Filed on Aug. 22, 2022, as Appl. No. 17/892,359.
Application 17/892,359 is a continuation of application No. PCT/JP2021/006698, filed on Feb. 22, 2021.
Claims priority of application No. 2020-032046 (JP), filed on Feb. 27, 2020; application No. 2020-161378 (JP), filed on Sep. 25, 2020; and application No. 2020-161379 (JP), filed on Sep. 25, 2020.
Prior Publication US 2022/0396490 A1, Dec. 15, 2022
Int. Cl. C01B 33/18 (2006.01); C09C 1/30 (2006.01)
CPC C01B 33/18 (2013.01) [C09C 1/3027 (2013.01); C09C 1/3081 (2013.01); C01P 2002/82 (2013.01); C01P 2004/34 (2013.01); C01P 2004/61 (2013.01); C01P 2004/64 (2013.01); C01P 2006/10 (2013.01); C01P 2006/12 (2013.01); C01P 2006/14 (2013.01)] 12 Claims
OG exemplary drawing
 
1. Hollow silica particles, which each comprise a shell layer containing silica and a space inside the shell layer,
wherein the hollow silica particles contain at least one metal M selected from the group consisting of Li, Na, K, Rb, Cs, Mg, Ca, Sr, and Ba,
wherein a concentration of the metal M contained in the hollow silica particles is 50 mass ppm or more and 5 mass % or less, and
wherein the hollow silica particles have a peak intensity derived from SiOH at a wavenumber of around 3,746 cm−1 of 0.60 or less by infrared spectroscopy, a relative permittivity at 1 GHz of from 1.3 to 5.0 and a dielectric loss tangent at 1 GHz of from 0.0001 to 0.05.