US 12,342,718 B2
Materials for electronic devices
Amir Hossain Parham, Darmstadt (DE); Christian Ehrenreich, Darmstadt (DE); and Jens Engelhart, Darmstadt (DE)
Assigned to MERCK KGAA, Darmstadt (DE)
Appl. No. 17/912,872
Filed by Merck Patent GmbH, Darmstadt (DE)
PCT Filed Mar. 22, 2021, PCT No. PCT/EP2021/057202
§ 371(c)(1), (2) Date Sep. 20, 2022,
PCT Pub. No. WO2021/191117, PCT Pub. Date Sep. 30, 2021.
Claims priority of application No. 20165094 (EP), filed on Mar. 24, 2020.
Prior Publication US 2023/0371372 A1, Nov. 16, 2023
Int. Cl. H10K 85/60 (2023.01); C07D 471/04 (2006.01); C07D 487/04 (2006.01); C07D 495/14 (2006.01); C09K 11/06 (2006.01); H10K 50/12 (2023.01)
CPC H10K 85/6572 (2023.02) [C07D 471/04 (2013.01); C07D 487/04 (2013.01); C07D 495/14 (2013.01); C09K 11/06 (2013.01); H10K 85/622 (2023.02); H10K 85/624 (2023.02); H10K 85/633 (2023.02); H10K 85/636 (2023.02); H10K 85/654 (2023.02); H10K 85/657 (2023.02); H10K 85/6574 (2023.02); H10K 85/6576 (2023.02); C09K 2211/1018 (2013.01); H10K 50/12 (2023.02); H10K 85/615 (2023.02)] 10 Claims
 
1. A compound according to one of the formulae (IV) to (VI)

OG Complex Work Unit Chemistry
and where the variables that occur are as follows:
X is N or CAr3;
Z is O;
Ar1 is the same or different at each instance and is selected from fused-on aromatic ring systems having 6 to 18 aromatic ring atoms; where the aromatic ring systems are each substituted by R1 radicals;
Ar2 is selected from phenyl, pyridine, naphthalene, triphenylene, carbazole, pyrimidine, triazine, triazinylphenylene and biphenyl, each substituted by one or more R2 radicals;
Ar3 is selected from H, D, and aromatic ring systems having 6 to 40 aromatic ring atoms; where the aromatic ring systems are each substituted by R3 radicals;
R1 is the same or different at each instance and is selected from H, D, aromatic ring systems having 6 to 40 aromatic ring atoms, and heteroaromatic ring systems having 5 to 40 aromatic ring atoms; where the aromatic ring systems and heteroaromatic ring systems mentioned are each substituted by R4 radicals;
R2 is the same or different at each instance and is selected from H, D, aromatic ring systems having 6 to 40 aromatic ring atoms, and heteroaromatic ring systems having 5 to 40 aromatic ring atoms; where the aromatic ring systems and heteroaromatic ring systems mentioned are each substituted by R4 radicals;
R3 is the same or different at each instance and is selected from H, and D;
R4 is the same or different at each instance and is selected from H, and D, and;
excluding the following compounds:

OG Complex Work Unit Chemistry