US 12,341,478 B2
Impedance matching circuit and plasma supply system and operating method
Birger Nordmann, Alfter (DE)
Assigned to TRUMPF Huettinger GmbH + Co. KG, Freiburg (DE)
Filed by TRUMPF Huettinger GmbH + Co. KG, Freiburg (DE)
Filed on Oct. 14, 2022, as Appl. No. 17/965,792.
Application 17/965,792 is a continuation of application No. PCT/EP2021/059449, filed on Apr. 12, 2021.
Claims priority of application No. 202020102084.6 (DE), filed on Apr. 15, 2020.
Prior Publication US 2023/0043171 A1, Feb. 9, 2023
Int. Cl. H03F 3/19 (2006.01); H01J 37/32 (2006.01); H03H 11/28 (2006.01)
CPC H03F 3/19 (2013.01) [H01J 37/32183 (2013.01); H03H 11/28 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01); H05H 2242/26 (2021.05)] 23 Claims
OG exemplary drawing
 
1. An impedance matching circuit-comprising:
a radiofrequency terminal;
a series circuit connected to the radiofrequency terminal, wherein the series circuit comprises at least one reactance and at least one switching element having a drive input;
a drive circuit connected to the drive input; and
a coupler connected to the drive circuit so as to enable a signal input,
wherein the coupler is configured to bypass a high voltage with respect to ground greater than an RF voltage occurring in the impedance matching circuit, or
wherein the coupler is configured to decouple a radiofrequency applied to the impedance matching circuit during operation at the radiofrequency terminal.