| CPC H01L 21/67051 (2013.01) [H01L 21/02052 (2013.01); H01L 21/6732 (2013.01); H01L 21/68764 (2013.01)] | 8 Claims |

|
1. A substrate treating apparatus comprising:
a treating vessel including an outer cup and an inner cup, the inner cup being inside of the outer cup, an outer wall of the inner cup and an inner wall of the outer cup defining a recollecting passage configured to pass a cleaning liquid therethrough for recollecting the cleaning liquid;
a rotatable spin head placed within the treating vessel and configured to support a cleaning jig to be placed thereon; and
a nozzle configured to spray the cleaning liquid onto the cleaning jig placed on the rotatable spin head, wherein
the outer cup includes
a bottom wall having a circular plate shape and having an opening at a center thereof,
a side wall having a circular cylindrical shape and extending vertically from a side end of the bottom wall,
an inclined wall extending from the side wall to be inclined inwardly and upwardly from a top of the side wall, and
a first protrusion protruding downward from a central area of the inclined wall and configured to direct the cleaning liquid scattered from the cleaning jig toward the recollection passage,
the bottom wall, the side wall and the inclined wall are provided integrally,
the inner cup comprises a dimple, the dimple being at the outer wall of the inner cup and configured to recollect the cleaning liquid at an upper surface of the inner cup, the dimple being vertically under and aligned with the first protrusion, and
the treating vessel is further configured to guide the cleaning liquid scattered from the cleaning jig to the recollection passage such that a portion of the cleaning liquid is deflected by the first protrusion and then is recollected in the dimple.
|