US 12,340,995 B2
Ruthenium-based sputtering target and method for manufacturing same
Tomohiro Maruko, Tokyo (JP); Hitoshi Arakawa, Tokyo (JP); Shohei Otomo, Tokyo (JP); and Yu Suzuki, Tokyo (JP)
Assigned to FURUYA METAL CO., LTD., Tokyo (JP)
Appl. No. 17/609,356
Filed by FURUYA METAL CO., LTD., Tokyo (JP)
PCT Filed Jun. 10, 2020, PCT No. PCT/JP2020/022829
§ 371(c)(1), (2) Date Nov. 5, 2021,
PCT Pub. No. WO2021/002167, PCT Pub. Date Jan. 7, 2021.
Claims priority of application No. 2019-122996 (JP), filed on Jul. 1, 2019.
Prior Publication US 2022/0319824 A1, Oct. 6, 2022
Int. Cl. H01J 37/34 (2006.01); C23C 14/14 (2006.01); C23C 14/34 (2006.01)
CPC H01J 37/3426 (2013.01) [C23C 14/14 (2013.01); C23C 14/3414 (2013.01); H01J 37/3423 (2013.01); H01J 37/3491 (2013.01); H01J 2237/332 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A ruthenium-based sputtering target having a cast structure,
wherein a sputter surface of the sputtering target includes at least two or more types of regions, and crystal surfaces in the regions are different from each other, each of the crystal surfaces being specified by a main peak of X-ray diffraction, and
wherein in (condition 1) or (condition 2), at 40% or more of locations, a sum of relative integrated intensities of a second peak and a third peak of X-ray diffraction in a sputter surface direction or a target thickness direction of the sputtering target is larger than a relative integrated intensity of the main peak, where
(condition 1)
in relation to the sputter surface direction, the sputtering target is a disk-shaped target having a center O, a radius r, and a thickness t, and the X-ray diffraction measurement locations are nine locations in grand total including one location at the center O, four locations 0.45r away from the center O in total, and four locations 0.9r away from the center O in total on imaginary crossing lines orthogonal to each other at the center O as a point of intersection, or
in relation to the target thickness direction, a cross section is formed which passes through one line of the imaginary crossing lines, the cross section has a rectangular shape having a vertical side of t and a horizontal side of 2r, and the X-ray diffraction measurement locations are nine locations in grand total including three locations including a center X as an X point, and locations 0.45t away upward and downward from the center X as an a-point and a b-point on a vertical transversal passing through the center O in total, and two locations 0.9r away from the a-point toward right and left sides in total, two locations 0.9r away from the X-point toward the right and left sides in total, and two locations 0.9r away from the b-point toward the right and left sides in total on the cross section, or
(condition 2)
in relation to the sputter surface direction, the sputtering target has a thickness of t and has a rectangular shape having a vertical length L1 and a horizontal length L2, wherein the rectangular shape includes a square shape in which L1 and L2 are equal, and alternatively, the rectangular shape includes a rectangular shape obtained by developing a side surface of a cylindrical shape having a length J and a circumference K, and in this form, L2 corresponds to the length J, L1 corresponds to the circumference K, and a relationship of J>K, J=K, or J<K is established between the length J and the circumference K, and when imaginary crossing lines are orthogonal to each other at a center of gravity O as a point of intersection, and the imaginary crossing lines are orthogonal to sides of the rectangular shape, the X-ray diffraction measurement locations are nine locations in grand total including one location at the center of gravity O, and two locations away by a distance of 0.25L1 from the center of gravity O in a vertical direction in total, two locations away by a distance of 0.25L2 from the center of gravity O in a horizontal direction in total, two locations away by a distance of 0.45L1 from the center of gravity O in the vertical direction in total, and two locations away by a distance of 0.45L2 from the center of gravity O in the horizontal direction in total on the imaginary crossing lines, or
in relation to the target thickness direction, a cross section is formed which passes through a line selected out of the imaginary crossing lines, the line being parallel to one side of a vertical side of L1 and a horizontal side of L2, when the one side is the horizontal side of L2, the cross section has a rectangular shape having a vertical side of t and the horizontal side of L2, and the X-ray diffraction measurement locations are nine locations in grand total including three locations including a center X as an X-point and locations 0.45t away upward and downward from the center X as an a-point and a b-point on a vertical transversal passing through the center of gravity O in total, and two locations 0.45L2 away from the a-point toward right and left sides in total, two locations 0.45L2 away from the X-point toward the right and left sides in total, and two locations 0.45L2 away from the b-point toward the right and left sides in total on the cross section.