US 12,340,977 B2
Plasma source and plasma processing apparatus
Kenta Kato, Yamanashi (JP); and Taro Ikeda, Yamanashi (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Sep. 2, 2022, as Appl. No. 17/902,642.
Claims priority of application No. 2021-148890 (JP), filed on Sep. 13, 2021.
Prior Publication US 2023/0081103 A1, Mar. 16, 2023
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32238 (2013.01) [H01J 37/3244 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A plasma source comprising:
a plasma generator including a first wall having an opening and a second wall facing the first wall, and forming a plasma generating space;
a dielectric window disposed on the first wall to block the opening and configured to transmit electromagnetic waves to the plasma generating space; and
a protruding portion disposed on the second wall, protruding from the second wall to be close to the dielectric window, and containing a conductor at least partially,
wherein the protruding portion has a gas hole that opens toward the dielectric window.