US 12,339,596 B2
Detection apparatus, detection method, exposure apparatus and article manufacturing method
Hironori Maeda, Saitama (JP); Ryo Takai, Tochigi (JP); and Masakatsu Yanagisawa, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Jan. 13, 2023, as Appl. No. 18/154,163.
Claims priority of application No. 2022-005821 (JP), filed on Jan. 18, 2022.
Prior Publication US 2023/0229095 A1, Jul. 20, 2023
Int. Cl. G03F 9/00 (2006.01); G03F 7/20 (2006.01)
CPC G03F 9/7088 (2013.01) [G03F 7/20 (2013.01); G03F 9/7092 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A detection apparatus for detecting a plurality of marks provided on an object, the detection apparatus comprising:
a stage configured to be rotatable while holding the object;
a plurality of detection systems arranged spaced apart from each other so as to detect, of the plurality of marks provided on the object held by the stage, marks different from each other; and
a processing unit configured to perform a first process of obtaining a first detection value by detecting the plurality of marks by one or more detection systems of the plurality of detection systems in a first state in which the stage is arranged at a first rotation angle, and a second process of obtaining a second detection value by detecting the plurality of marks by two or more detection systems of the plurality of detection systems in a second state in which the stage is arranged at a second rotation angle different from the first rotation angle, and obtain a difference between the first detection value and the second detection value for each of the plurality of marks,
wherein the second state is a state in which the stage is rotated with, as a center, one axis in a plane parallel to a holding surface of the stage for holding the object.