| CPC C23C 14/325 (2013.01) [C23C 14/505 (2013.01); C23C 14/54 (2013.01); C23C 14/568 (2013.01); G11B 5/8408 (2013.01); H01J 27/08 (2013.01); H01J 37/32055 (2013.01); H01J 37/32064 (2013.01); H01J 37/32614 (2013.01); H01J 37/32944 (2013.01); H01J 37/34 (2013.01); H01J 37/3417 (2013.01)] | 9 Claims |

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1. A deposition apparatus which forms a film on a substrate, comprising:
a moving unit configured to move a target along a moving axis;
a striker configured to generate an arc discharge;
an anode arranged to face the target;
a driving unit configured to perform rotation-drive of the striker so as to make a close state which the striker closes to a side surface around the moving axis of the target to generate the arc discharge; and
a control unit that is configured to control movement of the target by the moving unit so as to change a facing position on the side surface of the target facing the striker in the state,
wherein an axis of the rotation-drive of the striker is parallel to the moving axis; and
wherein the control unit is further configured to automatically change the facing position on the side surface of the target each time the arc discharge is generated, and
wherein the driving unit drives the striker such that a distance between the anode and the striker in the close state becomes constant.
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