US 12,338,151 B2
Treatment of azoles
Frank L. Sassaman, Fombell, PA (US); and Alan Knapp, Lake Oswego, OR (US)
Assigned to Evoqua Water Technologies LLC, Pittsburgh, PA (US)
Appl. No. 17/638,853
Filed by Evoqua Water Technologies LLC, Pittsburgh, PA (US)
PCT Filed Aug. 26, 2020, PCT No. PCT/US2020/047870
§ 371(c)(1), (2) Date Feb. 28, 2022,
PCT Pub. No. WO2021/041459, PCT Pub. Date Mar. 4, 2021.
Claims priority of provisional application 62/891,580, filed on Aug. 26, 2019.
Prior Publication US 2022/0298045 A1, Sep. 22, 2022
Int. Cl. C02F 9/00 (2023.01); C02F 1/32 (2023.01); C02F 1/42 (2023.01); C02F 1/44 (2023.01); C02F 1/66 (2023.01); C02F 1/72 (2023.01); C02F 101/38 (2006.01); C02F 103/34 (2006.01)
CPC C02F 9/00 (2013.01) [C02F 1/32 (2013.01); C02F 1/42 (2013.01); C02F 1/444 (2013.01); C02F 1/66 (2013.01); C02F 1/722 (2013.01); C02F 2101/38 (2013.01); C02F 2103/346 (2013.01); C02F 2209/20 (2013.01); C02F 2305/023 (2013.01)] 27 Claims
OG exemplary drawing
 
1. A method of treating chemical-mechanical polishing (CMP) wastewater comprising azoles, the method comprising:
providing the wastewater having a first azole concentration;
introducing the wastewater to an inlet of a wastewater treatment system, the wastewater treatment system constructed and arranged to produce and introduce free radicals into the wastewater; and
activating the wastewater treatment system to produce and introduce the free radicals into the wastewater in an amount sufficient to reduce the azole concentration in the wastewater and produce treated water having a second azole concentration, the second azole concentration less than the first azole concentration, an amount of free radical precursor introduced into the wastewater treatment system determined by at least the first azole concentration and the second azole concentration.