US 12,337,473 B2
Method and mechanical design of a flexure interface for ultra-high-vacuum nanopositioning Invar base near-zero-length feedthrough
Deming Shu, Darien, IL (US); Steven P. Kearney, Schaumberg, IL (US); Jayson W. Anton, Chicago, IL (US); and William F. Toter, Park Ridge, IL (US)
Assigned to UChicago Argonne, LLC, Chicago, IL (US)
Filed by UChicago Argonne, LLC, Chicago, IL (US)
Filed on Jun. 14, 2021, as Appl. No. 17/346,537.
Prior Publication US 2022/0399137 A1, Dec. 15, 2022
Int. Cl. G21K 1/06 (2006.01); B25J 7/00 (2006.01); G01N 23/20025 (2018.01); H05H 7/14 (2006.01)
CPC B25J 7/00 (2013.01) [G01N 23/20025 (2013.01); H05H 7/14 (2013.01); G01N 2223/321 (2013.01); G21K 1/06 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A flexure interface apparatus for ultrahigh-vacuum (UHV) applications for precision nanopositioning systems comprising:
an ultrahigh-vacuum (UHV) flange;
an ultrahigh-vacuum (UHV) metrology base integrated with said ultrahigh-vacuum (UHV) flange; said UHV metrology base directly mounted to a support mounting base surface in air with nanopositioning and thermal stability;
said UHV metrology base and said UHV flange cooperatively providing a precision and compact flexure interface structure defining a UHV metrology base near-zero-length feedthrough; and
said precision and compact flexure interface structure having sufficient strength to hold ultrahigh-vacuum force and sufficiently flexible to survive with thermal expansion stress during bakeout process.