US 12,337,439 B2
Multiple disk pad conditioner
Jay Gurusamy, Santa Clara, CA (US); Steven M. Zuniga, Soquel, CA (US); Takashi Fujikawa, Sunnyvale, CA (US); and Jeonghoon Oh, Saratoga, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Aug. 15, 2022, as Appl. No. 17/888,007.
Prior Publication US 2024/0051081 A1, Feb. 15, 2024
Int. Cl. B24B 37/20 (2012.01)
CPC B24B 37/20 (2013.01) 20 Claims
OG exemplary drawing
 
1. A multiple disk pad conditioner for conditioning a polishing pad, comprising:
a conditioning arm; and
a plurality of conditioning head bases attached to the conditioning arm, wherein:
each conditioning head base comprises a pivot arm;
each pivot arm comprises a plurality of conditioning heads;
each of the plurality of conditioning heads has a conditioning disk affixed thereto,
each of the plurality of conditioning head bases comprise a rotational axis, and
each of the rotational axes are disposed a distance apart in a first direction that extends along a length of the conditioning arm.