US 12,016,092 B2
Gas distribution ceramic heater for deposition chamber
Pingyan Lei, San Jose, CA (US); Dien-Yeh Wu, San Jose, CA (US); Jallepally Ravi, San Ramon, CA (US); Manjunatha Koppa, Bengaluru (IN); Ambarish Toorihal, Bangalore (IN); Sandesh Yadamane, Bangalore (IN); Vinod Konda Purathe, Bangalore (IN); and Xiaoxiong Yuan, San Jose, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed on Nov. 30, 2020, as Appl. No. 17/106,735.
Claims priority of provisional application 62/944,180, filed on Dec. 5, 2019.
Prior Publication US 2021/0176831 A1, Jun. 10, 2021
Int. Cl. H05B 3/48 (2006.01); C23C 14/54 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); H05B 3/14 (2006.01)
CPC H05B 3/48 (2013.01) [C23C 14/541 (2013.01); C23C 16/45565 (2013.01); C23C 16/4586 (2013.01); H05B 3/141 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A lid heater for a deposition chamber, comprising:
a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extends to a plurality of first gas outlets on the second side;
a heating element embedded in the ceramic heater body; and
an RF electrode embedded in the ceramic heater body proximate the second side such that the RF electrode is not exposed to a process volume facing surface of the lid heater, wherein the first plurality of gas channels extend through the RF electrode.