US 12,014,902 B2
System and method of cleaning process chamber components
Jong Yun Kim, Hwaseong-si (KR); Kim Seong Sim, Singapore (SG); Roman M. Mostovoy, San Francisco, CA (US); Won Ho Sung, Asan-si (KR); and Pei-Chia Chen, Tokyo (JP)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Aug. 15, 2022, as Appl. No. 17/887,992.
Prior Publication US 2024/0055230 A1, Feb. 15, 2024
Int. Cl. H01J 37/32 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01)
CPC H01J 37/3244 (2013.01) [C23C 16/4405 (2013.01); C23C 16/4583 (2013.01); C23C 16/52 (2013.01); H01J 37/32357 (2013.01); H01J 37/32862 (2013.01); H01J 37/32477 (2013.01); H01J 2237/24507 (2013.01); H01J 2237/3321 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A system, comprising:
a process chamber comprising a substrate support disposed within a chamber volume of the process chamber;
a gas distribution assembly facing the substrate support;
a gas baffle fluidly coupled to the gas distribution assembly;
a sensor coupled to the process chamber and configured to monitor at least one characteristic of the volume of the process chamber; and
a dynamic gas assist fluidly coupled to the gas baffle and communicatively coupled to the sensor, the dynamic gas assist comprising:
a movable body disposed within a housing, the housing concentric with the movable body;
a split wing bisecting the movable body and movable along an axis perpendicular to a longitudinal axis of the movable body; and
a barrier plate coupled to the movable body and disposed adjacent to the split wing.