US 12,014,895 B2
Multi-beam electronics scan
Tomas Plettner, San Ramon, CA (US); Doug Larson, Sunnyvale, CA (US); Mark Cawein, Milpitas, CA (US); and Jason W. Huang, Fremont, CA (US)
Assigned to KLA Corporation, Milpitas, CA (US)
Filed by KLA Corporation, Milpitas, CA (US)
Filed on Dec. 1, 2021, as Appl. No. 17/540,169.
Claims priority of provisional application 63/129,559, filed on Dec. 22, 2020.
Prior Publication US 2022/0199352 A1, Jun. 23, 2022
Int. Cl. H01J 37/10 (2006.01); H01J 37/20 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/10 (2013.01) [H01J 37/20 (2013.01); H01J 37/28 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system comprising:
an electron emitter source configured to emit an illumination beam;
a beam splitter lens array configured to split the illumination beam into multiple electron beams;
an electronic deflection system configured to deflect each of the electron beams in a plurality of directions, including a first direction, along two different axes; and
a swathing stage configured to move a sample during writing of scan lines by the electronic beams with a constant velocity in a second direction that is parallel to the first direction, wherein the scan lines are written parallel to the second direction in a rectangular pattern by each of the electron beams, wherein a length of the rectangular pattern is measured along the first direction and the length is longer than a width of the rectangular pattern.