CPC G06V 40/13 (2022.01) [G06F 1/1626 (2013.01); G06F 3/0412 (2013.01); G06F 21/32 (2013.01); G06V 40/1318 (2022.01); H01L 27/14683 (2013.01); H01L 27/14685 (2013.01)] | 12 Claims |
1. A method of manufacturing a detection sensor, comprising:
forming a biometric information sensing layer comprising a transistor on a base layer;
forming an initial optical pattern layer on the biometric information sensing layer;
patterning the initial optical pattern layer to form a plurality of transmissive portions spaced apart from each other and having a first zeta potential;
coating a light blocking material to form an initial light blocking portion that covers a side surface and an upper surface of the transmissive portions and has a second zeta potential different from the first zeta potential;
spraying an abrasive having the first zeta potential on the initial light blocking portion; and
polishing the initial light blocking portion such that the upper surface of the transmissive portions is exposed to form a light blocking portion, wherein the initial light blocking portion is polished by the abrasive using a pad,
wherein the light blocking portion comprises light blocking patterns having a concave shape recessed in a direction toward the base layer between the transmissive portions.
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