US 12,013,644 B2
Method for manufacturing electronic device
Tetsuya Kamimura, Shizuoka (JP); Tetsuya Shimizu, Shizuoka (JP); and Satoru Murayama, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Dec. 27, 2021, as Appl. No. 17/561,999.
Application 17/561,999 is a continuation of application No. 16/143,496, filed on Sep. 27, 2018, granted, now 11,256,173.
Application 16/143,496 is a continuation of application No. PCT/JP2017/010620, filed on Mar. 16, 2017.
Claims priority of application No. 2016-073255 (JP), filed on Mar. 31, 2016; application No. 2016-150624 (JP), filed on Jul. 29, 2016; and application No. 2017-045323 (JP), filed on Mar. 9, 2017.
Prior Publication US 2022/0121123 A1, Apr. 21, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/32 (2006.01); G03F 7/00 (2006.01); G03F 7/027 (2006.01); G03F 7/039 (2006.01); G03F 7/40 (2006.01); H01L 21/02 (2006.01)
CPC G03F 7/32 (2013.01) [G03F 7/027 (2013.01); G03F 7/0397 (2013.01); G03F 7/322 (2013.01); G03F 7/40 (2013.01); G03F 7/70925 (2013.01); H01L 21/0206 (2013.01)] 34 Claims
 
1. A method for manufacturing an electronic device, the method comprising performing a treatment using a treatment liquid for manufacturing a semiconductor, the treatment liquid for manufacturing a semiconductor comprising:
a quaternary ammonium compound represented by the following Formula (N);
at least one additive selected from the group consisting of an anionic surfactant, a nonionic surfactant, a cationic surfactant, and a chelating agent;
water; and
one kind or two or more kinds of metal atoms selected from the group consisting of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn,
wherein a ratio T1 of a total mass of the metal atoms to the sum of a total mass of the additive and the total mass of the metal atoms as defined by the following formula is in a range from 1 ppt to 1 ppm,
T1=[total mass of the metal atoms]/([total mass of the additive]+[total mass of the metal atoms]),

OG Complex Work Unit Chemistry
in Formula (N), RN1 to RN4 each independently represent an alkyl group, a phenyl group, a benzyl group, or a cyclohexyl group, and the alkyl group, the phenyl group, the benzyl group, or the cyclohexyl group may have a substituent.