	US 12,013,642 B2
	Pellicle for flat panel display photomask
Bryan S. Kasprowicz, Dallas, TX (US); and Christopher Progler, Plano, TX (US)
Assigned to PHOTRONICS, INC., Brookfield, CT (US)
Filed by PHOTRONICS, INC., Brookfield, CT (US)
Filed on Nov. 21, 2022, as Appl. No. 17/991,084.
Application 17/991,084 is a continuation of application No. 17/444,927, filed on Aug. 12, 2021, granted, now 11,537,050.
Application 17/444,927 is a continuation of application No. 16/568,365, filed on Sep. 12, 2019, granted, now 11,119,403, issued on Sep. 14, 2021.
Claims priority of provisional application 62/730,119, filed on Sep. 12, 2018.
Prior Publication US 2023/0161259 A1, May 25, 2023
Int. Cl. G03F 7/20 (2006.01); G03F 1/38 (2012.01); G03F 1/62 (2012.01); G03F 1/64 (2012.01)

CPC G03F 7/2002 (2013.01) [G03F 1/38 (2013.01); G03F 1/62 (2013.01); G03F 1/64 (2013.01)]

21 Claims

1. A method of making a flat panel display, comprising:

obtaining large area mask blank manufacturing data corresponding to a plurality of large area mask blanks;

simulating performance of the plurality of large area mask blanks by overlaying pattern data associated with at least one circuit pattern on the large area mask blank manufacturing data;

optimizing a photolithographic process based on the simulated performance by pairing one of the plurality of large area mask blanks with the pattern data; and

manufacturing a large area photomask using the one of the plurality of large area mask blanks.