	US 12,013,638 B2
	Dual-cure phase-separation type photosensitive resin composition for continuous 3D printing with high precision
Wenbin Wang, Suzhou (CN); and Jie Xiong, Suzhou (CN)
Assigned to SUZHOU POLLY NEW MATERIAL TECH CO., LTD., Jiangsu (CN)
Appl. No. 17/433,946
Filed by SUZHOU POLLY NEW MATERIAL TECH CO., LTD., Jiangsu (CN)
PCT Filed Nov. 4, 2020, PCT No. PCT/CN2020/126356 § 371(c)(1), (2) Date Aug. 25, 2021, PCT Pub. No. WO2021/218097, PCT Pub. Date Nov. 4, 2021.
Claims priority of application No. 202010356325.9 (CN), filed on Apr. 29, 2020.
Prior Publication US 2022/0342305 A1, Oct. 27, 2022
Int. Cl. G03F 7/035 (2006.01); G03F 7/027 (2006.01); G03F 7/031 (2006.01); G03F 7/038 (2006.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01)

CPC G03F 7/035 (2013.01) [G03F 7/027 (2013.01); G03F 7/031 (2013.01); G03F 7/0382 (2013.01); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12)]

20 Claims

1. A dual-cure phase-separation type photosensitive resin composition for continuous 3D printing with high precision, wherein the photosensitive resin composition comprises:

an acrylate having a cross-linkable double bond;

a polyurethane prepolymer;

a chain extender; and

a photoinitiator; wherein

the polyurethane prepolymer has an isocyanate active group, and

the polyurethane prepolymer having the isocyanate active group is produced by a reaction between an isocyanate and a polyether polyol with a molecular weight larger than or equal to 4000 under heating and catalytic action.