| CPC G03F 7/0042 (2013.01) [C07F 7/2224 (2013.01)] | 11 Claims |
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1. A semiconductor photoresist composition, comprising:
a condensed product produced by a condensation reaction between an organotin compound represented by Chemical Formula 1 and at least one organic acid compound selected from a substituted organic acid, an organic acid comprising at least two acid functional groups, and a substituted or unsubstituted sulfonic acid; and
a solvent:
 wherein, in Chemical Formula 1,
R1 is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, or -L-O—Rd,
Ra, Rb, and Rc are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, or a substituted or unsubstituted C6 to C30 aryl group,
L is a single bond, or a substituted or unsubstituted C1 to C20 alkylene group, and
Rd is a substituted or unsubstituted C1 to C20 alkyl group, and
wherein a weight ratio of the organotin compound and the organic acid compound is about 85:15 to about 99:1.
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