US 12,013,622 B2
Made-to-stock patterned transparent conductive layer
Yigang Wang, Plymouth, MN (US); Jean-Christophe Giron, Edina, MN (US); Bryan D. Greer, Northfield, MN (US); Sebastian Marius Sarrach, Lakeville, MN (US); and Thomas Doublein, Saint Paul, MN (US)
Assigned to SAGE ELECTROCHROMICS, INC., Faribault, MN (US)
Filed by SAGE ELECTROCHROMICS, INC., Fairbault, MN (US)
Filed on Sep. 22, 2022, as Appl. No. 17/934,418.
Application 17/934,418 is a continuation of application No. 16/715,873, filed on Dec. 16, 2019, granted, now 11,460,748.
Claims priority of provisional application 62/786,004, filed on Dec. 28, 2018.
Prior Publication US 2023/0013577 A1, Jan. 19, 2023
Int. Cl. G02F 1/163 (2006.01); G02F 1/155 (2006.01); G02F 1/157 (2006.01)
CPC G02F 1/163 (2013.01) [G02F 1/155 (2013.01); G02F 1/157 (2013.01); G02F 2001/1552 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An electrochromic device obtained by production process, comprising:
providing a substrate and a stack overlying the substrate, the stack comprising:
a first transparent conductive layer over the substrate;
a second transparent conductive layer over the substrate;
a cathodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer; and
an anodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer; and
patterning a first region of the second transparent conductive layer without removing the material from the first region, wherein after patterning the first region, the first region comprises a first resistivity and a second region of the second transparent conductive layer comprises a second resistivity, wherein the first resistivity is different from the second resistivity, wherein patterning the second transparent conductive layer to form the first resistivity and the second resistivity is patterned through an insulating layer; wherein the first region and the second region comprise the same material.