US 12,013,341 B2
Microscopy method and system
Gerrit Sitters, Amsterdam (NL); and Mattijs De Groot, Amsterdam (NL)
Assigned to LUMICKS DSM HOLDING B.V., (NL)
Appl. No. 17/311,182
Filed by LUMICKS DSM HOLDING B.V., Amsterdam (NL)
PCT Filed Dec. 17, 2019, PCT No. PCT/NL2019/050845
§ 371(c)(1), (2) Date Jun. 4, 2021,
PCT Pub. No. WO2020/130812, PCT Pub. Date Jun. 25, 2020.
Claims priority of application No. 2022223 (NL), filed on Dec. 17, 2018.
Prior Publication US 2021/0372928 A1, Dec. 2, 2021
Int. Cl. G01N 21/64 (2006.01); G02B 21/00 (2006.01); G02B 21/06 (2006.01); G02B 21/16 (2006.01); G02B 21/26 (2006.01)
CPC G01N 21/6458 (2013.01) [G02B 21/0076 (2013.01); G02B 21/008 (2013.01); G02B 21/06 (2013.01); G02B 21/16 (2013.01); G02B 21/26 (2013.01); G02B 21/0036 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of excitation microscopy comprising:
providing a sample;
trapping an object in the sample at a trapping position by applying a position dependent trapping force to the object;
applying a depletion beam at an interaction position in the sample for illumination of a portion of the sample associated with the trapped object; and
wherein the method comprises at least one of:
controlling the depletion beam such that, when the depletion beam is applied at the interaction position, an optical force exerted by the depletion beam on the object causes a displacement of the object that is less than an optical resolution of an imaging system for observing a Stimulated emission depletion fluorescence; and
controlling at least one of the depletion beam and the position dependent trapping force on the object such that, when the depletion beam is applied at the interaction position, the optical force exerted by the depletion beam on the object is less than 5% of the trapping force.