US 12,012,653 B2
Cleaning assemblies for substrate processing chambers
Yuxing Zhang, Santa Clara, CA (US); Tuan Anh Nguyen, San Jose, CA (US); Amit Kumar Bansal, Milpitas, CA (US); Nitin Pathak, Mumbai (IN); Saket Rathi, Santa Clara, CA (US); Thomas Rubio, Santa Clara, CA (US); Udit S. Kotagi, Bengaluru (IN); Badri N. Ramamurthi, Los Gatos, CA (US); and Dharma Ratnam Srichurnam, Bengaluru (IN)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 23, 2021, as Appl. No. 17/210,018.
Prior Publication US 2022/0307129 A1, Sep. 29, 2022
Int. Cl. C23C 16/44 (2006.01); C23C 16/455 (2006.01)
CPC C23C 16/4405 (2013.01) [C23C 16/45563 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A cleaning assembly for a substrate processing chamber, the cleaning assembly comprising:
a gas manifold fluidly coupled to a lid of the substrate processing chamber and a distribution ring located below and adjacent to a pumping ring, the gas manifold configured to provide a first portion of cleaning fluid to a lower portion of an internal volume of the substrate processing chamber through the distribution ring and a second portion of cleaning fluid into a processing region of the internal volume of the substrate processing chamber through the lid,
the distribution ring comprising:
a body with an inlet and
an outlet fluidly coupled to the lower portion of the internal volume of the substrate processing chamber via a sidewall of the substrate processing chamber; and
a cleaning conduit configured to fluidly couple the gas manifold to the distribution ring.