US 12,012,492 B2
Multiblock copolymer films, methods of making same, and uses thereof
Ulrich B. Wiesner, Ithaca, NY (US); Rachel M. Dorin, San Francisco, CA (US); Joerg Werner, San Francisco, CA (US); and William A. Phillip, New Haven, CT (US)
Assigned to Cornell University, Ithaca, NY (US); and Yale University, New Haven, CT (US)
Filed by CORNELL UNIVERSITY, Ithaca, NY (US); and YALE UNIVERSITY, New Haven, CT (US)
Filed on Aug. 29, 2022, as Appl. No. 17/897,751.
Application 15/286,115 is a division of application No. 14/115,218, granted, now 9,527,041, issued on Dec. 27, 2016, previously published as PCT/US2012/036514, filed on May 4, 2012.
Application 17/897,751 is a continuation of application No. 16/924,446, filed on Jul. 9, 2020, granted, now 11,466,134.
Application 16/924,446 is a continuation of application No. 15/286,115, filed on Oct. 5, 2016, granted, now 10,711,111, issued on Jul. 14, 2020.
Claims priority of provisional application 61/482,354, filed on May 4, 2011.
Prior Publication US 2022/0411596 A1, Dec. 29, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C08J 5/18 (2006.01); B01D 67/00 (2006.01); B01D 69/02 (2006.01); B01D 69/12 (2006.01); B01D 71/02 (2006.01); B01D 71/26 (2006.01); B01D 71/28 (2006.01); B01D 71/44 (2006.01); B01D 71/80 (2006.01); C08F 297/04 (2006.01); C08L 53/00 (2006.01)
CPC C08J 5/18 (2013.01) [B01D 67/0009 (2013.01); B01D 69/02 (2013.01); B01D 69/12 (2013.01); B01D 71/26 (2013.01); B01D 71/28 (2013.01); B01D 71/44 (2013.01); B01D 71/80 (2013.01); C08F 297/04 (2013.01); C08L 53/00 (2013.01); B01D 71/022 (2013.01); B01D 2325/021 (2013.01); B01D 2325/023 (2013.01); B01D 2325/04 (2013.01); B01D 2325/48 (2013.01); C08J 2353/00 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A polymeric isoporous graded film comprising:
a triblock copolymer having:
a first terminal block incorporating a hydrophobic polymer, wherein the first terminal block has a glass transition temperature (Tg) of 25° C. or less, and wherein the hydrophobic polymer is selected from the group consisting of poly(isoprene), poly(butadiene), poly(butylene), and poly(isobutylene);
a second terminal block comprising a hydrogen-bonding polymer selected from the group consisting of poly((4-vinyl)pyridine), poly((2-vinyl) pyridine), poly(ethylene oxide), a poly(methacrylate), poly(acrylic acid), and poly(hydroxystyrene), and
a hydrophobic block located between the first terminal block and the second terminal block, the hydrophobic block selected from the group consisting of a poly(styrene), polyethylene, polypropylene, polyvinyl chloride, and polytetrafluoroethylene,
wherein the film has a bulk layer having a thickness of from 5 microns to 500 microns and pores having a size of from 10 nm to 100 microns; and
wherein the film has a toughness of at least 5 GJ/m3.