US 12,011,490 B2
Dental photocurable composition excellent in operability and storage stability
Kenzo Yamamoto, Kyoto (JP); Hideto Kasaba, Kyoto (JP); Daisuke Hara, Kyoto (JP); and Shunsuke Miyata, Kyoto (JP)
Assigned to SHOFU INC., Kyoto (JP)
Filed by SHOFU INC., Kyoto (JP)
Filed on Mar. 11, 2022, as Appl. No. 17/692,568.
Claims priority of application No. 2021-040033 (JP), filed on Mar. 12, 2021; application No. 2021-040037 (JP), filed on Mar. 12, 2021; application No. 2021-040039 (JP), filed on Mar. 12, 2021; application No. 2021-040040 (JP), filed on Mar. 12, 2021; application No. 2021-149804 (JP), filed on Sep. 14, 2021; and application No. 2021-149805 (JP), filed on Sep. 14, 2021.
Prior Publication US 2022/0401312 A1, Dec. 22, 2022
Int. Cl. A61K 6/896 (2020.01); A61C 5/00 (2017.01); A61K 6/17 (2020.01); A61K 6/62 (2020.01); A61K 6/71 (2020.01); A61K 6/76 (2020.01); A61K 6/77 (2020.01)
CPC A61K 6/896 (2020.01) [A61C 5/00 (2013.01); A61K 6/17 (2020.01); A61K 6/62 (2020.01); A61K 6/71 (2020.01); A61K 6/76 (2020.01); A61K 6/77 (2020.01)] 13 Claims
 
1. A dental photocurable composition, comprising (A) polymerizable monomer, (B) photosensitizer, (D) photopolymerization accelerator and (E) filler, wherein,
the (A) polymerizable monomer has a (meth) acrylic group and/or a (meth) acrylamide group as the polymerizable group,
the (B) photosensitizer comprises α-diketones,
the dental photocurable composition comprises (D1) aliphatic tertiary amine compound represented by formula (1) as the (D) photopolymerization accelerator,
the dental photocurable composition comprises (E1) hydrophobized silica fine particle having an average diameter of primary particle of 1 to 40 nm as the (E) filler,
the (E1) hydrophobized silica fine particle is a hydrophobic silica fine particle hydrophobized by surface treatment with a silane coupling agent and/or a modified silicone oil, and
the dental photocurable composition comprises, with respect to 100 parts by mass of the (A) polymerizable monomer,
0.02 to 1 parts by mass of the (B) photosensitizer,
0.1 to 10 parts by mass of the (D1) aliphatic tertiary amine compound, and
0.5 to 30 parts by mass of the (E1) hydrophobized silica fine particle,

OG Complex Work Unit Chemistry
wherein R1 represents a substituent consisting of three or more carbons having an electron-withdrawing group at α-carbon and/or β-carbon of an amine starting from N, R2 represents a substituent consisting of three or more carbons which may have an electron-withdrawing group, R3 represents a substituent consisting of one or more carbons which may have an electron-withdrawing group, and a-carbon of N in the formula (1) is not an electron-withdrawing group, and
wherein the electron-withdrawing group of R1 is a substituent selected from a functional group selected from the group consisting of a hydroxyl group, a carboxyl group, a vinyl group, an aryl group and a halogen, and, an organic group which is bonded via an ether bond, an ester bond, a urethane bond or a urea bond and may have —OH group, —O-group, —C(O)-group, —S-group, —NH—C(O)—NH-group, —C(O)—O-group, —O—C(O)-group, —OC(O)—NH-group, —NH—C(O)—O-group, an aromatic hydrocarbon group, or a polymerizable functional group capable of radical polymerization.