| CPC H01M 4/1395 (2013.01) [C23C 16/45555 (2013.01); H01M 4/0404 (2013.01); H01M 4/0428 (2013.01); H01M 4/0471 (2013.01); H01M 4/134 (2013.01); H01M 10/052 (2013.01); H01M 2004/021 (2013.01)] | 12 Claims |

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1. A method of manufacturing an electrode structure, the method comprising:
preparing a base substrate;
forming an amorphous seed layer covering the base substrate;
crystallizing the amorphous seed layer to produce a crystallized seed layer;
providing a first reducing metal precursor on the crystallized seed layer to remove a first native oxide film formed on the crystallized seed layer; and
after providing the first reducing metal precursor on the crystallized seed layer, forming a functional film for a secondary battery, which covers the crystallized seed layer and has a crystalline structure.
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