| CPC H01L 23/3107 (2013.01) [H01L 21/31053 (2013.01); H01L 21/31058 (2013.01); H01L 21/561 (2013.01); H01L 21/568 (2013.01); H01L 21/76895 (2013.01); H01L 21/78 (2013.01); H01L 23/3128 (2013.01); H01L 23/3135 (2013.01); H01L 23/481 (2013.01); H01L 24/05 (2013.01); H01L 24/19 (2013.01); H01L 24/97 (2013.01); H01L 25/105 (2013.01); H01L 2224/04105 (2013.01); H01L 2224/05124 (2013.01); H01L 2224/05139 (2013.01); H01L 2224/05144 (2013.01); H01L 2224/05147 (2013.01); H01L 2224/05155 (2013.01); H01L 2224/05184 (2013.01); H01L 2224/12105 (2013.01); H01L 2224/16227 (2013.01); H01L 2224/16235 (2013.01); H01L 2224/32225 (2013.01); H01L 2224/73204 (2013.01); H01L 2224/73267 (2013.01); H01L 2224/92125 (2013.01); H01L 2224/94 (2013.01); H01L 2225/1035 (2013.01); H01L 2225/1058 (2013.01); H01L 2924/10253 (2013.01); H01L 2924/10271 (2013.01); H01L 2924/10272 (2013.01); H01L 2924/1032 (2013.01); H01L 2924/14 (2013.01); H01L 2924/1431 (2013.01); H01L 2924/1432 (2013.01); H01L 2924/1436 (2013.01); H01L 2924/1437 (2013.01); H01L 2924/15311 (2013.01); H01L 2924/19041 (2013.01); H01L 2924/19042 (2013.01); H01L 2924/19043 (2013.01); H01L 2924/19102 (2013.01)] | 20 Claims |

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1. An integrated circuit structure comprising:
a device die comprising:
a semiconductor substrate comprising:
a first vertical edge;
a second vertical edge over the first vertical edge; and
a top surface connecting the first vertical edge to the second vertical edge;
a plurality of dielectric layers over the semiconductor substrate;
a first polymer layer over the plurality of dielectric layers, wherein the first polymer layer comprises opposing curved edges, and the plurality of dielectric layers laterally extend beyond the opposing curved edges of the first polymer layer, and wherein lower portions of the opposing curved edges of the first polymer layer are more vertical than respective upper portions of the opposing curved edges, and wherein the opposing curved edges are comprised in sidewalls of the device die; and
a metal pillar in the first polymer layer; and
a molding compound in contact with both of the first vertical edge and the top surface, wherein the molding compound forms a horizontal interface with the top surface of the semiconductor substrate.
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