| CPC H01L 21/68707 (2013.01) [G03F 7/168 (2013.01); H01L 21/027 (2013.01); H01L 21/67109 (2013.01); H01L 21/6715 (2013.01); H01L 21/67167 (2013.01); H01L 21/67173 (2013.01); G03F 7/091 (2013.01)] | 8 Claims |
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1. An apparatus for treating a substrate, the apparatus comprising:
a transfer part;
a first transfer robot and a second transfer robot disposed in the transfer part to align and overlap with each other in a longitudinal direction of the transfer part;
a liquid treating part disposed at one side of the transfer part to apply a liquid onto the substrate by supplying the liquid to the substrate; and
a heat treating part disposed at an opposite side of the transfer part, and configured to perform heat-treatment with respect to the substrate,
wherein the heat treating part includes:
a front-heating chamber and a rear heat-treating chamber;
a cooling transfer module provided to exchange the substrate between the first transfer robot and the second transfer robot, and to cool the substrate,
wherein the first transfer robot moves in a first moving passage and the second transfer robot moves in a second moving passage, the first moving passage and the second moving passage being disposed in immediate adjacent to each other in the longitudinal direction of the transfer part,
wherein the cooling transfer module, the transfer part, and the liquid treating part are sequentially stacked in a traversal direction of the transfer part perpendicular to the longitudinal direction of the transfer part; and
wherein the cooling transfer module is disposed underneath at a boundary at which the first moving passage of the first transfer robot meets the second moving passage of the first transfer robot and between the front-heating chamber and the rear heat-treating chamber.
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