US 12,334,383 B2
Substrate support gap pumping to prevent glow discharge and light-up
James David Carducci, Sunnyvale, CA (US); Kenneth S. Collins, San Jose, CA (US); Michael R. Rice, Pleasanton, CA (US); Kartik Ramaswamy, San Jose, CA (US); Silverst Antony Rodrigues, Bangalore (IN); and Yang Yang, Cupertino, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Dec. 16, 2021, as Appl. No. 17/553,305.
Prior Publication US 2023/0197495 A1, Jun. 22, 2023
Int. Cl. H01L 21/683 (2006.01); H01J 37/32 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/6833 (2013.01) [H01J 37/32642 (2013.01); H01J 37/32724 (2013.01); H01J 37/32834 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01); H01J 2237/334 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate support for use in a substrate processing chamber, comprising:
a pedestal having a first side configured to support a substrate and a second side opposite the first side;
a plurality of substrate lift pin openings extending through the pedestal from the first side to the second side;
a plurality of substrate lift pins extending through the plurality of substrate lift pin openings, wherein a plurality of first gaps are disposed between the plurality of substrate lift pins and respective sidewalls of the plurality of substrate lift pin openings; and
vacuum lines that extend from the sidewalls of the plurality of substrate lift pin openings and that are configured to pump down the plurality of substrate lift pin openings, wherein the vacuum lines form a T-junction in the pedestal, and wherein the vacuum lines are directly exposed to the plurality of substrate lift pins.