CPC H01L 21/6833 (2013.01) [H01J 37/32642 (2013.01); H01J 37/32724 (2013.01); H01J 37/32834 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01); H01J 2237/334 (2013.01)] | 20 Claims |
1. A substrate support for use in a substrate processing chamber, comprising:
a pedestal having a first side configured to support a substrate and a second side opposite the first side;
a plurality of substrate lift pin openings extending through the pedestal from the first side to the second side;
a plurality of substrate lift pins extending through the plurality of substrate lift pin openings, wherein a plurality of first gaps are disposed between the plurality of substrate lift pins and respective sidewalls of the plurality of substrate lift pin openings; and
vacuum lines that extend from the sidewalls of the plurality of substrate lift pin openings and that are configured to pump down the plurality of substrate lift pin openings, wherein the vacuum lines form a T-junction in the pedestal, and wherein the vacuum lines are directly exposed to the plurality of substrate lift pins.
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