CPC H01L 21/02658 (2013.01) [C23C 16/4586 (2013.01); H01L 21/67103 (2013.01)] | 20 Claims |
1. A heating system for substrate processing comprising:
a first heater comprising a continuous heating coil;
a first heater rod coupled to a first connection point of the first heater;
a second heater rod coupled to a second connection point of the first heater, wherein each of the first heater rod and the second heater rod are configured to be screwed onto the first heater and comprise a passage disposed therethrough;
a socket coupled to one of the first heater rod or the second heater rod at a distal end opposite the first heater, the socket comprising:
a feedthrough coupled to the first heater rod or the second heater rod and comprising a feedthrough inert gas passage fluidly coupled to the passage disposed through the first heater rod or the second heater rod; and
a cooling plate disposed around at least a portion of the feedthrough.
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