US 12,334,311 B2
Circuits for edge ring control in shaped dc pulsed plasma process device
Linying Cui, Cupertino, CA (US); and James Rogers, Los Gatos, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 28, 2022, as Appl. No. 17/706,573.
Application 17/706,573 is a continuation of application No. 16/198,479, filed on Nov. 21, 2018, granted, now 11,289,310.
Prior Publication US 2022/0223386 A1, Jul. 14, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01); H01L 21/00 (2006.01); H01L 21/687 (2006.01)
CPC H01J 37/32642 (2013.01) [H01J 37/321 (2013.01); H01J 37/32715 (2013.01); H01L 21/68735 (2013.01); H01J 2237/04924 (2013.01); H01J 2237/1202 (2013.01); H01J 2237/3344 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A substrate support assembly comprising:
an electrostatic chuck (ESC) having a ceramic body, the ceramic body having a center and an outer perimeter, the ceramic body comprising:
a substrate support portion disposed at the center and having a substrate electrode embedded in the ceramic body of the ESC for applying a substrate voltage to a substrate; and
an edge ring portion adjacent the outer perimeter and circumscribing the substrate support portion, the edge ring portion having an edge ring electrode embedded in ceramic body of the ESC for applying an edge ring voltage to an edge ring;
an edge ring voltage control circuit coupled to the edge ring electrode disposed in the ceramic body, wherein the edge ring voltage control circuit further comprises:
a first fixed resistor coupled in series with a first fixed capacitor; and
a second variable capacitor coupled in parallel with the first fixed resistor and first capacitor, wherein a first common terminal between the second variable capacitor and the first fixed resistor is coupled to at least one shaped DC pulse voltage source and wherein a second common terminal between the second variable capacitor and the first fixed capacitor is coupled to the edge ring electrode; and
a substrate voltage control circuit coupled to the substrate electrode, wherein the edge ring voltage control circuit and substrate voltage control circuit are independently tunable to supply a different direct current voltage to the edge ring electrode and the substrate electrode.