US 12,334,304 B2
System and methods for implementing a micro pulsing scheme using dual independent pulsers
A N M Wasekul Azad, Santa Clara, CA (US); Kartik Ramaswamy, San Jose, CA (US); Yue Guo, Redwood City, CA (US); Nicolas J. Bright, Arlington, WA (US); and Yang Yang, San Diego, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 29, 2022, as Appl. No. 18/059,658.
Prior Publication US 2024/0177968 A1, May 30, 2024
Int. Cl. H01L 21/67 (2006.01); H01J 37/32 (2006.01)
CPC H01J 37/32146 (2013.01) [H01J 37/32128 (2013.01); H01J 37/32137 (2013.01); H01J 37/32174 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A substrate processing system, the system comprising:
a substrate support assembly disposed within a processing chamber;
a bias electrode disposed within the substrate support assembly;
a pulse voltage waveform generator configured to deliver a pulse voltage waveform to the bias electrode;
a support base operable as a radio frequency (RF) electrode;
a RF generator assembly electrically coupled to the support base;
a controller coupled to the pulse voltage waveform generator and the RF generator assembly, wherein the controller comprises a plurality of pulsers and at least one synchronization pulser, the at least one synchronization pulser configured to transmit a synchronization signal; and
a memory for storing a program that is configured to provide instructions, which when executed by the controller, cause the pulse voltage waveform to be generated, wherein the pulse voltage waveform comprises a plurality of asymmetric voltage pulses.