US 12,334,299 B2
Charged particle beam device
U Oh, Tokyo (JP); Minoru Yamazaki, Tokyo (JP); and Yuko Sasaki, Tokyo (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Appl. No. 17/915,034
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
PCT Filed Mar. 31, 2020, PCT No. PCT/JP2020/014739
§ 371(c)(1), (2) Date Sep. 27, 2022,
PCT Pub. No. WO2021/199235, PCT Pub. Date Oct. 7, 2021.
Prior Publication US 2023/0162943 A1, May 25, 2023
Int. Cl. H01J 37/22 (2006.01); G01N 23/2251 (2018.01); G06F 16/2455 (2019.01); H01J 37/28 (2006.01)
CPC H01J 37/222 (2013.01) [G01N 23/2251 (2013.01); G06F 16/2455 (2019.01); H01J 37/28 (2013.01); G01N 2223/07 (2013.01); G01N 2223/418 (2013.01); G01N 2223/507 (2013.01); G01N 2223/6116 (2013.01); H01J 2237/24521 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/24578 (2013.01)] 6 Claims
OG exemplary drawing
 
1. A charged particle beam device comprising:
an electron gun that irradiates a sample with an electron beam;
an image processing unit that acquires an image of the sample from a signal generated by the sample due to the electron beam;
a database that holds correspondence between a first parameter that is an optical condition, a second parameter that is a value related to device performance, and a third parameter that is information on the device configuration, and stores a plurality of analysis values and measurement values; and
a learning machine that searches the database and obtains the first parameter that satisfies a target value of the second parameter.