US 12,333,706 B2
Mask inspection apparatus and method for inspecting a mask having first and second openings
Dae Won Baek, Cheonan-si (KR)
Assigned to Samsung Display Co., Ltd., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-si (KR)
Filed on Jun. 28, 2021, as Appl. No. 17/360,837.
Claims priority of application No. 10-2020-0079076 (KR), filed on Jun. 29, 2020.
Prior Publication US 2021/0407067 A1, Dec. 30, 2021
Int. Cl. G06T 7/00 (2017.01); C23C 14/04 (2006.01); G01N 21/956 (2006.01); G03F 1/84 (2012.01)
CPC G06T 7/001 (2013.01) [C23C 14/042 (2013.01); G01N 21/95607 (2013.01); G03F 1/84 (2013.01); G01N 2021/95676 (2013.01); G06T 2207/30108 (2013.01); G06T 2207/30121 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A mask inspection method comprising:
providing a deposition mask comprising a plurality of first openings and a plurality of second openings, each of the first openings having a same shape in a plan view and different from that of each of the second openings, the deposition mask comprising a first surface and a second surface opposite the first surface, a second side end of each of the first openings located at the second surface surrounding a first side end of the respective first opening located at the first surface, and a second side end of each of the second openings located at the second surface surrounding a first side end of the respective second opening located at the first surface;
designating a first group and a second group, each comprising at least one of the first openings and at least one of the second openings;
comparing an image of the first group with an image of the second group; and
determining whether the first group and the second group are defective based on a result of comparing the image of the first group with the image of the second group,
wherein an arrangement of the first and second openings of the first group is the same as an arrangement of the first and second openings of the second group and rotated in the plan view.