US 12,333,700 B2
Chemical-dose substrate deposition monitoring
Albert Barrett Hicks, III, Sunnyvale, CA (US); and Serghei Malkov, Hayward, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 30, 2022, as Appl. No. 17/709,303.
Prior Publication US 2023/0316486 A1, Oct. 5, 2023
Int. Cl. G06T 7/00 (2017.01); G01B 11/06 (2006.01); G06T 7/12 (2017.01)
CPC G06T 7/0004 (2013.01) [G01B 11/0625 (2013.01); G06T 7/12 (2017.01); G06T 2200/24 (2013.01); G06T 2207/10024 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A method, comprising:
receiving, by a processing device, image data characterizing light reflected from a film disposed on a processed surface of a substrate, the image data corresponding to one or more locations across a surface of the film and indicating a camera perspective angle associated with capturing the image data;
determining, by the processing device using the image data, reflection data indicating one or more reflections effects of the light reflected from the film;
processing the reflection data using one or more machine-learning models (MLMs), processing the reflection data comprising:
determining, using a first MLM of the one or more MLMs based on the image data, a boundary of the substrate, and
obtaining, using a second MLM of the one or more MLMs based on the image data and the boundary of the substrate, one or more segmented regions disposed within the boundary of the substrate;
determining, by the processing device, one or more process result metrics of the film corresponding to the one or more locations and the one or more segmented regions; and
performing, by the processing device, at least one of i) preparing the one or more process result metrics for display on a graphical user interface (GUI) or ii) preparing the one or more process result metrics for processing in a script-based environment.