US 12,332,587 B2
Image formation apparatus, image formation method, and image formation program
Michiaki Haginoya, Tokyo (JP); and Hiroshi Rokugawa, Tokyo (JP)
Assigned to Oki Electric Industry Co., Ltd., Tokyo (JP)
Filed by Oki Electric Industry Co., Ltd., Tokyo (JP)
Filed on May 1, 2024, as Appl. No. 18/651,692.
Claims priority of application No. 2023-079225 (JP), filed on May 12, 2023.
Prior Publication US 2024/0377773 A1, Nov. 14, 2024
Int. Cl. G03G 15/16 (2006.01); G03G 15/00 (2006.01)
CPC G03G 15/1675 (2013.01) [G03G 15/5004 (2013.01); G03G 15/5029 (2013.01); G03G 2215/00734 (2013.01); G03G 2215/00738 (2013.01)] 13 Claims
OG exemplary drawing
 
1. An image formation apparatus comprising:
an image carrier configured to carry a developer image;
a conveyor belt configured to convey a medium;
a transfer member that faces the image carrier with the conveyor belt therebetween and is configured to transfer the developer image from the image carrier to the medium on the conveyor belt; and
a voltage supply device configured to supply a transfer voltage to the transfer member, wherein
the voltage supply device is configured to control the transfer voltage such that a first voltage ratio, which is a ratio of a first transfer voltage to a second transfer voltage, is greater than a second voltage ratio, which is a ratio of a third transfer voltage to a fourth transfer voltage, where (i) the first transfer voltage is the transfer voltage for a first medium that has a first thickness, a first resistance, and a first width, (ii) the second transfer voltage is the transfer voltage for a second medium that has the first thickness, the first resistance, and a second width larger than the first width, (iii) the third transfer voltage is the transfer voltage for a third medium that has a second thickness larger than the first thickness, a second resistance smaller than the first resistance, and the first width, and (iv) the fourth transfer voltage is the transfer voltage for a fourth medium that has the second thickness, the second resistance, and the second width.