US 12,332,576 B2
Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography
Dirk Heinrich Ehm, Beckingen (DE); Jens Kugler, Aalen (DE); Benjahman Julius Modeste, Elchingen (DE); and Marwene Nefzi, Ulm (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Nov. 14, 2022, as Appl. No. 17/986,517.
Application 17/986,517 is a continuation of application No. PCT/EP2021/060328, filed on Apr. 21, 2021.
Claims priority of application No. 102020206249.8 (DE), filed on May 18, 2020.
Prior Publication US 2023/0072843 A1, Mar. 9, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70975 (2013.01) 22 Claims
OG exemplary drawing
 
1. A method of maintaining a projection exposure apparatus comprising first and second modules and a reference element to which the first and second modules are referenced, the method comprising:
removing the first module;
attaching a service module to or in a vicinity of the projection exposure apparatus;
referencing the service module to the reference element; and
using the service module to implement a maintenance measure of the projection exposure apparatus.