| CPC G03F 7/70741 (2013.01) [G03F 1/24 (2013.01); G03F 7/70033 (2013.01); G03F 7/70841 (2013.01); H05G 2/0027 (2024.08)] | 18 Claims |
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1. A target supply system comprising:
a load lock chamber configured to contain a solid target substance;
a solid target supply pipe connected to the load lock chamber;
a pressure regulator configured to regulate an externally supplied gas pressure;
a gas pressure supply pipe connected to the pressure regulator;
a melting tank connected to both the solid target supply pipe and the gas pressure supply pipe, and configured to melt the solid target substance supplied from the load lock chamber via the solid target supply pipe to generate a liquid target substance;
a nozzle configured to discharge the liquid target substance by a gas pressure supplied from the pressure regulator to the melting tank via the gas pressure supply pipe; and
a buffer tank configured to communicate with the melting tank and supply a gas pressure thereto when the solid target substance is supplied to the melting tank,
wherein the gas pressure supply pipe includes a branch portion, a first pipe configured to supply a gas pressure from the branch portion toward the melting tank, a second pipe configured to supply a gas pressure from the branch portion toward the load lock chamber, and a common pipe between the pressure regulator and the branch portion,
first and second gas pressure supply valves are arranged respectively at the first and second pipes,
a gas pressure supply path from the buffer tank toward the melting tank joins the first pipe at a gas pressure supply path among the first pipe from the first gas pressure supply valve toward the melting tank, and
the buffer tank communicates with the load lock chamber via the first pipe and the second pipe when the solid target substance is supplied to the melting tank.
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