US 12,332,572 B2
Configuring optical layers in imprint lithography processes
Vikramjit Singh, Pflugerville, TX (US); Michael Nevin Miller, Austin, TX (US); Frank Y. Xu, Austin, TX (US); and Shuqiang Yang, Austin, TX (US)
Assigned to Magic Leap, Inc., Plantation, FL (US)
Filed by Magic Leap, Inc., Plantation, FL (US)
Filed on Jun. 5, 2024, as Appl. No. 18/734,904.
Application 17/222,492 is a division of application No. 16/859,584, filed on Apr. 27, 2020, granted, now 10,969,692, issued on Apr. 6, 2021.
Application 18/734,904 is a continuation of application No. 18/080,490, filed on Dec. 13, 2022, granted, now 12,044,976.
Application 18/080,490 is a continuation of application No. 17/685,781, filed on Mar. 3, 2022, granted, now 11,550,226, issued on Jan. 10, 2023.
Application 17/685,781 is a continuation of application No. 17/222,492, filed on Apr. 5, 2021, granted, now 11,281,109, issued on Mar. 22, 2022.
Application 16/859,584 is a continuation of application No. 16/165,027, filed on Oct. 19, 2018, granted, now 10,670,971, issued on Jun. 2, 2020.
Claims priority of provisional application 62/574,826, filed on Oct. 20, 2017.
Prior Publication US 2024/0329540 A1, Oct. 3, 2024
Int. Cl. G03F 7/20 (2006.01); G02B 1/118 (2015.01); G03F 7/00 (2006.01)
CPC G03F 7/7015 (2013.01) [G02B 1/118 (2013.01); G03F 7/0002 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A method of producing an optical layer, the method comprising:
providing a substrate having a first side and a second side opposite the first side;
disposing a first layer on the first side of the substrate, wherein disposing the first layer on the first side of the substrate comprises imprinting a nanolayer on the first side of the substrate, the nanolayer being structured to be an anti-reflection layer and having an effective refractive index different from a refractive index of the substrate;
disposing a second layer on the second side of the substrate, wherein disposing the second layer on the second side of the substrate comprises imprinting a functional pattern on the second side of the substrate, a structure of the functional pattern being different from the nanolayer; and
refraining from disposing any anti-reflective nanolayers on the second side of the substrate.