US 12,332,569 B2
Metrology for improving DUV laser alignment
Zhong Quan Zhao, San Diego, CA (US)
Assigned to Cymer, LLC, San Diego, CA (US)
Appl. No. 17/783,351
Filed by Cymer, LLC, San Diego, CA (US)
PCT Filed Dec. 9, 2020, PCT No. PCT/US2020/064126
§ 371(c)(1), (2) Date Jun. 8, 2022,
PCT Pub. No. WO2021/133556, PCT Pub. Date Jul. 1, 2021.
Claims priority of provisional application 62/953,115, filed on Dec. 23, 2019.
Prior Publication US 2023/0009554 A1, Jan. 12, 2023
Int. Cl. G03F 7/00 (2006.01); H01L 21/027 (2006.01); H01S 3/00 (2006.01); H01S 3/034 (2006.01); H01S 3/139 (2006.01)
CPC G03F 7/70025 (2013.01) [G03F 7/70591 (2013.01); H01L 21/0275 (2013.01); H01S 3/0014 (2013.01); H01S 3/034 (2013.01); H01S 3/139 (2013.01)] 22 Claims
OG exemplary drawing
 
1. A light source apparatus comprising:
a gas discharge stage comprising:
an optical amplifier comprising a chamber configured to hold a gas discharge medium, the gas discharge medium outputting a light beam; and
a set of optical elements configured to form an optical resonator around the optical amplifier;
a sensing apparatus;
an optical arrangement configured to image light from a plurality of distinct object planes within the gas discharge stage onto the sensing apparatus, wherein the optical arrangement includes one or more focusing optical elements that are adjustable along an optical path of the light to be imaged to thereby select which object plane within the gas discharge stage is imaged onto the sensing apparatus;
an adjustment apparatus in physical communication with one or more optical components within the gas discharge stage and configured to modify at least one geometric aspect of the optical components; and
a control apparatus in communication with the sensing apparatus and the adjustment apparatus, the control apparatus configured to provide a signal to the adjustment apparatus based on an output from the sensing apparatus.