US 12,332,563 B2
Pattern-forming method and composition
Hiroyuki Komatsu, Tokyo (JP); and Motohiro Shiratani, Tokyo (JP)
Assigned to JSR CORPORATION, Tokyo (JP)
Filed by JSR CORPORATION, Tokyo (JP)
Filed on Jan. 25, 2022, as Appl. No. 17/583,270.
Application 17/583,270 is a division of application No. 17/018,169, filed on Sep. 11, 2020, granted, now 11,270,883.
Claims priority of application No. 2019-166674 (JP), filed on Sep. 12, 2019.
Prior Publication US 2022/0145113 A1, May 12, 2022
Int. Cl. G03F 7/004 (2006.01); C08F 8/00 (2006.01); C09D 129/00 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/321 (2006.01)
CPC G03F 7/004 (2013.01) [C08F 8/00 (2013.01); C09D 129/00 (2013.01); G03F 7/0392 (2013.01); H01L 21/02118 (2013.01); H01L 21/02334 (2013.01); H01L 21/0271 (2013.01); H01L 21/321 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A composition comprising:
a polymer comprising: a first structural unit which comprises an acid-labile group; and a functional group which selectively bonds to a metal atom or an Si—OH bond;
an acid generating agent; and
a solvent,
wherein the functional group is located at an end of a main chain of the polymer, the functional group being introduced after completing polymerization of monomers that give the first structural unit,
wherein when the functional group selectively bonds to a metal atom, the functional group is at least one selected from the group consisting of a phosphonic acid group, a phosphonic acid ester group, a cyano group, a sulfanyl group, a monohydroxyboryl group, a pyridine ring-containing group, an ethylenic carbon-carbon double bond-containing group, and a carbon-carbon triple bond-containing group, and when the functional group selectively bonds to an Si-OH bond, the functional group is at least one group selected from the group consisting of a silanol group and a tertiary amino group, and
wherein the first structural unit is represented by formula (1-1):

OG Complex Work Unit Chemistry
wherein,
R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group;
X represents the acid-labile group which is represented by at least one selected from the group consisting of formula (2-1-1), formula (2-3-1), formula (2-3-4), and formula (2-4-1);
R2 represents a single bond, —O—, —COO—, or —CONH—;
Ar represents a group obtained by removing from an arene having 6 to 20 ring atoms, (m+n+1) hydrogen atoms on an aromatic ring thereof;
m is an integer of 0 to 10, wherein in a case in which m is 1, R3 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, in a case in which m is no less than 2, a plurality of R3s are identical or different from each other and each R3 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, or two or more of the plurality of R3s taken together represent an alicyclic structure having 4 to 20 ring atoms, together with the carbon chain to which the two or more of the plurality of R3s bond; and
n is an integer of 1 to 11, wherein a sum of m and n is no greater than 11, and in a case in which n is no less than 2, a plurality of Xs are identical or different from each other:

OG Complex Work Unit Chemistry
wherein in the formulae (2-1-1), (2-3-1), (2-3-4), and (2-4-1), * denotes a bonding site to the oxygen atom in the formula (1-1).