| CPC C23C 16/45565 (2013.01) [C23C 16/45572 (2013.01); C23C 16/505 (2013.01); H01J 37/32082 (2013.01); H01J 37/32357 (2013.01); H01J 37/32422 (2013.01); H01J 37/3244 (2013.01); H01J 37/32522 (2013.01); H01J 37/32715 (2013.01); H01L 21/67011 (2013.01); H01L 21/67017 (2013.01); H01L 21/67207 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01); H01L 21/68757 (2013.01); H01L 21/68785 (2013.01); B05C 13/02 (2013.01); C23C 16/4581 (2013.01); C23C 16/4583 (2013.01); H01J 37/32642 (2013.01); H01J 2237/334 (2013.01); H01L 21/67069 (2013.01); H01L 21/6715 (2013.01)] | 20 Claims |

|
1. An apparatus for use in processing substrates, the apparatus comprising: a showerhead having a plurality of heat transfer plenums all located in between a top surface of the showerhead and a bottom surface of the showerhead, the plurality of heat transfer plenums including a first plenum, a second plenum, and a third plenum: a fluid inlet port connected with the first plenum; a fluid outlet port connected with one of the heat transfer plenums; a plurality of flow channels located in between the top surface of the showerhead and the bottom surface of the showerhead, each flow channel connecting the second plenum with the third plenum and placing the second plenum in fluidic communication with the third plenum within the showerhead; a plurality of first flow restriction features positioned between the first plenum and the second plenum such that flow of fluid from the fluid inlet port and through the first plenum and the second plenum to the flow channels passes in between the first flow restriction features; a gas plenum located in between the top surface of the showerhead and the bottom surface of the showerhead; and a plurality of injectors leading from the gas plenum to the bottom surface of the showerhead.
|