	US 12,331,210 B2
	Composition for forming a patterned metal film on a substrate
Natalia Zamoshchik, Rehovot (IL)
Assigned to OrelTech Ltd., Rehovot (IL)
Filed by OrelTech Ltd., Rehovot (IL)
Filed on Apr. 18, 2023, as Appl. No. 18/302,531.
Application 18/302,531 is a continuation in part of application No. 15/491,036, filed on Apr. 19, 2017, granted, now 11,661,527.
Application 15/491,036 is a continuation of application No. PCT/US2015/056438, filed on Oct. 20, 2015.
Claims priority of provisional application 62/066,392, filed on Oct. 21, 2014.
Prior Publication US 2023/0257613 A1, Aug. 17, 2023
Int. Cl. C09D 11/52 (2014.01); C09D 11/322 (2014.01)

CPC C09D 11/52 (2013.01) [C09D 11/322 (2013.01)]

16 Claims

1. An ink composition for forming a patterned thin metal film on a substrate, comprising:

metal cations;

at least one solvent; and

at least one additive for changing the viscosity of said ink composition;

wherein the patterned thin metal film is formed on a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma; wherein the at least one solvent is a mixture of at least two types of solvents; and wherein the at least two types of solvents include at least a high surface tension solvent that is glycol-based solvent or Dimethyl sulfoxide (DMSO) and a low surface tension solvent that is alcohol-based solvent; wherein the metal cations include AgNO₃; wherein the concentration of the metal cations is in the range from 3 wt. % to 40 wt. %.