	US 12,330,994 B2
	CVD functionalized particles for CMC applications
Brendan M. Lenz, Wethersfield, CT (US); Sarah A. Frith, Jupiter, FL (US); and Olivier H. Sudre, Glastonbury, CT (US)
Assigned to RTX Corporation, Farmington, CT (US)
Filed by Raytheon Technologies Corporation, Farmington, CT (US)
Filed on Jul. 30, 2021, as Appl. No. 17/390,072.
Prior Publication US 2023/0036697 A1, Feb. 2, 2023
Int. Cl. C04B 35/628 (2006.01); C04B 35/64 (2006.01); C04B 35/657 (2006.01); C04B 35/80 (2006.01)

CPC C04B 35/80 (2013.01) [C04B 35/62802 (2013.01); C04B 35/62844 (2013.01); C04B 35/62884 (2013.01); C04B 35/62892 (2013.01); C04B 35/64 (2013.01); C04B 35/657 (2013.01); C04B 2235/3217 (2013.01); C04B 2235/3244 (2013.01); C04B 2235/3821 (2013.01); C04B 2235/3826 (2013.01); C04B 2235/3873 (2013.01); C04B 2235/422 (2013.01); C04B 2235/428 (2013.01); C04B 2235/5244 (2013.01); C04B 2235/5252 (2013.01); C04B 2235/614 (2013.01); C04B 2235/616 (2013.01)]

8 Claims

1. A method of forming a ceramic matrix composite component, the method comprising:

forming a plurality of ceramic fiber plies;

selectively applying functionalized ceramic particles into voids within each of the plurality of ceramic fiber plies;

laying up and debulking a stack of the plurality of ceramic fiber plies including the functionalized ceramic particles; and

subsequently densifying the stack of ceramic fiber plies;

wherein the functionalized ceramic particles are produced by coating base ceramic particles with a first chemical compound through a chemical vapor deposition or chemical vapor infiltration process;

wherein the first chemical compound is one or more of silicon carbide (SiC), boron nitride (BN), silicon boron nitride (SiBN), carbon (C), boron carbide (B₄C), aluminum nitride (AlN), aluminum oxide (Al₂O₃), zirconium dioxide (ZrO₂), silicon nitride (Si₃N₄), silicon dioxide (SiO₂), and silicon oxycarbide (SiOC).