| CPC B29C 35/0805 (2013.01) [B29C 59/02 (2013.01); B29C 2037/903 (2013.01)] | 17 Claims |
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1. An imprint method of forming a pattern in a first imprint material on a first shot region of a substrate using a mold, comprising:
obtaining a curing time until a second imprint material on a second shot region is cured to a first target hardness by being irradiated with a third light;
determining an irradiation amount of a first light, to be used in a preliminary curing of the first imprint material on the first shot region of the substrate, based on the curing time obtained by using the third light to cure the second imprint material to the first target hardness;
supplying the first imprint material on the first shot region of the substrate;
bringing the mold into contact with the first imprint material on the first shot region of the substrate;
performing preliminary curing of the first imprint material on the first shot region of the substrate such that the first imprint material on the first shot region of the substrate is cured to the first target hardness by irradiating the first imprint material with the first light, the first light having an illuminance higher than an illuminance of the third light used to cure the second imprint material to the first target hardness, in order to execute alignment between the mold and the substrate; and
performing, after the alignment is completed, main curing in which the first imprint material on the first shot region of the substrate is cured to a second target hardness higher than the first target hardness by irradiating the first imprint material with a second light,
wherein the alignment is executed during at least part of a period from starting irradiation of the first light in the preliminary curing until starting irradiation of the second light in the main curing, and
the irradiation amount of the first light is determined based on an integrated value of a time of irradiation with the third light which is discretely irradiated to the second shot region until a deviation of a relative position between the mold and the second shot region falls within an allowable range, or an integrated value of a time of irradiation with the third light which is discretely irradiated to the second shot region until a change rate of an amplitude in a waveform of the relative position becomes a target value.
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